Liquid photo-positive resist based on o-naphto-chinon-diazide and Novolack, used in the production of printed circuit boards.
Features :
POSITIV 20 is a classic liquid photo-resist that transfers patterns directly onto working materials for processing by etching.
The lacquer resists strong acidic etching products however can be easily be removed by solvents (ester, ketone) or aqueous alkalines.
The lacquer is at its most photo-sensitive at close utlra-violet range (UVA).
The lacquer should therefore be applied in yellow light or darkened daylight.
Applications :
The main application for POSITIV 20 is the production of printed circuits boards.
The transparent positive-pattern from the circuit diagram is accurately transferred.
Surfaces impervious to light e.g. the electrical circuits, do remain present after etching.
Other application include photo-lithographics on metal or glass.
Connexion
